ATTHI, N.; ARAMPHONGPHUN, C.; YANPIRAT, P.; CHARNSETTHIKUL, P.; JEAMSAKSIRI, W. Study of optimization condition for spin coating of the photoresist film on 3 inches wafer by taguchi design of an experiment. Asia-Pacific Journal of Science and Technology, [S. l.], v. 13, n. 3, p. 335–340, 2017. Disponível em: https://so01.tci-thaijo.org/index.php/APST/article/view/83062. Acesso em: 30 sep. 2026.