Atthi, Nithi, Chuckaphun Aramphongphun, Patcharaporn Yanpirat, Peerayuth Charnsetthikul, and Wutthinan Jeamsaksiri. 2017. “Study of optimization condition for spin coating of the photoresist film on 3 inches wafer by taguchi design of an experiment”. Asia-Pacific Journal of Science and Technology 13 (3):335-40. https://so01.tci-thaijo.org/index.php/APST/article/view/83062.